PVD for microelectronics :
Powell, Ronald A.
PVD for microelectronics : sputter deposition applied to semiconductor manufacturing / Ronald A. Powell, Stephen M. Rossnagel. - San Diego : Academic Press, ©1999. - 1 online resource (xiii, 419 pages) : illustrations. - Thin films ; v. 26 . - Thin films (San Diego, Calif.) ; v. 26. .
Includes bibliographical references and indexes.
Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index.
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
9780125330268 012533026X 9780080542928 0080542921
Thin film devices--Design and construction.
Vapor-plating.
Thin films.
TECHNOLOGY & ENGINEERING--Electronics--Solid State.
TECHNOLOGY & ENGINEERING--Electronics--Semiconductors.
Thin film devices--Design and construction.
Thin films.
Vapor-plating.
Física geral.
Electronic books.
TK7872.T55 / P68 1999eb
PVD for microelectronics : sputter deposition applied to semiconductor manufacturing / Ronald A. Powell, Stephen M. Rossnagel. - San Diego : Academic Press, ©1999. - 1 online resource (xiii, 419 pages) : illustrations. - Thin films ; v. 26 . - Thin films (San Diego, Calif.) ; v. 26. .
Includes bibliographical references and indexes.
Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index.
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
9780125330268 012533026X 9780080542928 0080542921
Thin film devices--Design and construction.
Vapor-plating.
Thin films.
TECHNOLOGY & ENGINEERING--Electronics--Solid State.
TECHNOLOGY & ENGINEERING--Electronics--Semiconductors.
Thin film devices--Design and construction.
Thin films.
Vapor-plating.
Física geral.
Electronic books.
TK7872.T55 / P68 1999eb