Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.

By:

Kääriäinen, Tommi

Contributor(s):

Cameron, David, 1949-
Kääriäinen, Marja-Leena
Sherman, Arthur, 1931-
Wiley eBooks

Publisher: Salem, Massachusetts : Scrivener Publishing, LLC ; Hoboken, New Jersey : Wiley, [2013]Edition: 2nd editionDescription: 1 online resourceContent type:

text

Media type:

computer

Carrier type:

online resource

ISBN:

9781118747384
1118747380
9781118747421
1118747429
9781118747346
1118747348
9781118747407
1118747402
9781299619128
1299619126

Subject(s):

Chemical vapor deposition
Epitaxy
Microelectronics
Nanotechnology
SCIENCE -- Nanoscience
TECHNOLOGY & ENGINEERING -- Nanotechnology & MEMS
Chemical vapor deposition
Epitaxy
Microelectronics
Nanotechnology
Nanotechnologie
Atomlagenabscheidung
Mikroelektromekaniska system

Genre/Form:

Electronic books.

Additional physical formats: Print version:: Atomic layer deposition.LOC classification:

TS695

Online resources:

Click here to access online
Click here to access online

Item type:

eBooks

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Includes bibliographical references and index.

John Wiley and Sons Wiley eBooks

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