Nanolithography and patterning techniques in microelectronics / edited by David G. Bucknall.
Series: Woodhead Publishing in materials©2005Description: 1 online resource (xiv, 409 pages) : illustrationsContent type:- text
- computer
- online resource
- 9781615831869
- 161583186X
- 9781855739314
- 1855739313
- 1845690907
- 9781845690908
- TK7874 .N318 2005eb

Includes bibliographical references and index.
Print version record.
Prelium; Contents; Block copolymer nanolithography; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Chemomechanical surface modification of materials for patterning; Patterning of polymer thin films; Ion beam patterning; Nanofabrication by shadow deposition through nanostencils; Photolithography beyond the diffraction limit; Ink-jet printing as a tool in manufacturing and instrumentation; Actuators and patterns for microfluidic control; Manipulation of biomolecules and reactions.
Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100 nm less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using nanolithography scientists can drive patterning currents through surfaces while building a 3D structure from a series of patterned layers. Electron induced chemical lithography can create ultra-high resolution templates for the site selective immobilisation of molecules, to form functional, hierarchic.
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