Silicon epitaxy / volume editors, Danilo Crippa, Daniel L. Rode, Maurizio Masi.

Contributor(s):

text

Media type:

computer

Carrier type:

online resource

ISBN:

9780080541006
0080541003
012752181X
9780127521817
1281057169
9781281057167

Subject(s):

Genre/Form:

Electronic books.

Additional physical formats: Print version:: Silicon epitaxy.LOC classification:

QC610.9 .S48eb vol. 72

Online resources:

Click here to access online

Contents:

1: CVD Technologies for Silicon: A Quick Survey -- 2: Epitaxial Growth Theory: Vapor-Phase Chemistry and Doping -- 3: Epitaxial Growth Facilities, Equipment, and Supplies -- 4: Epitaxial Growth Techniques -- 5: Epitaxial Growth Techniques: Molecular Beam Epitaxy -- 6: Epitaxial Growth Modeling -- 7: Epitaxial Layer Characterization and Metrology -- 8: Epitaxy for Discretes and Power Devices -- 9: Epitaxy on Patterned Wafers -- 10: Si-Based Alloys: SiGe and SiGe:C -- 11: Silicon Epitaxy: New Applications.

Summary: Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Item type:

eBooks

Average rating: 0.0 (0 votes)

Holdings ( 0 )
Title notes ( 5 )

No physical items for this record

Includes bibliographical references and index.

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Print version record.

Elsevier ScienceDirect All Books