Measurement of high-speed signals in solid state devices / volume editor, Robert B. Marcus.
Series: Semiconductors and semimetals ; v. 28.©1990Description: 1 online resource (xv, 438 pages) : illustrationsContent type:- text
- computer
- online resource
- 9780080864259
- 0080864252
- 0127521283
- 9780127521282
- QC610.9 .S47 1990eb
- digitized 2010 HathiTrust Digital Library committed to preserve

Includes bibliographical references and index.
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Front Cover; Measurement of High-Speed Signals in Solid State Devices; Copyright Page; Contents; List of Contributors; Preface; Chapter 1. Materials and Devices for High-Speed Devices and Optoelectronic Applications; I. Introduction; II. Important Materials Parameters; III. Device Parameters; IV. Devices for Switching and Amplification; V. Microwave Two-Terminal Devices; VI. Integrated Circuits; VII. Optoelectronic Devices; VIII. Conclusions; References; Chapter 2. Electronic Wafer Probing Techniques; I. Introduction; II. Electronic Characterization Methods; III. Wafer Probing.
IV. ConclusionsReferences; Chapter 3. Picosecond Photoconductivity: High-Speed Measurements of Devices and Materials; I. Introduction; II. Materials for Picosecond Photoconductors; III. Generation and Detection of Ultrafast Electrical Pulses; IV. Optoelectronic Measurement Systems and Their Applications; V. Discussion and Future Trends; References; Chapter 4. Electro-Optic Measurement Techniques for Picosecond Materials. Devices and Integrated Circuits; I. Introduction; II. Electro-Optic Modulation; III. Principles of Electro-Optic Sampling; IV. Hybrid Sampling of Devices and Materials.
V. Electro-Optic Probing of Integrated CircuitsVI. Nonsampling Techniques; VII. Conclusions; References; Chapter 5. Direct Optical Probing of Integrated Circuits and High-Speed Devices; I. Introduction; II. General Considerations; III. Direct Probing by Photocarrier Generation; IV. Direct Probing by Electro-Optic Sampling; V. Direct Probing by Charge-Density Modulation; VI. Phase-Space Absorption Quenching; VII. Summary and Outlook; References; Chapter 6. Electron-Beam Probing; I. Introduction: Pros and Cons of the Focused Electron Beam for Probing High-Speed Electrical Signals.
II. Background Science, Technology, and HistoryIII. Sampling by E-Beam Pulsing; IV. Electron Energy Filtering in E-Beam Testing; V. The Existing Limits of Performance; VI. Useful and Less Useful "Modes" (Including Brief Application Descriptions); VII. Software Control; References; Chapter 7. Photoemissive Probing; I. Introduction; II. Photoemission; III. Signal Detection and Waveform Measurement; IV. Performance of Photoemissive Sampling; V. Discussion; VI. Summary and Future Trends; References; Glossary of Symbols; Index; Contents of Previous Volumes.
SEMICONDUCTORS & amp; SEMIMETALS V28.
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