Handbook of vacuum arc science and technology : fundamentals and applications / edited by Raymond L. Boxman, David M. Sanders, Philip J. Martin ; foreword by James M. Lafferty.

Contributor(s):

text

Media type:

computer

Carrier type:

online resource

ISBN:

1591240980
9781591240983
9780815517795
0815517793

Subject(s):

Genre/Form:

Electronic books.

Additional physical formats: Print version:: Handbook of vacuum arc science and technology.LOC classification:

QC705 .H36 1995eb

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Click here to access online

Contents:

Part I: Fundamentals of Vacuum Arc Science and Technology -- Electrical Discharges and Plasmas-A Brief Tutorial -- Arc Ignition -- Cathode Spots -- The Interelectrode Plasma -- Anode Phenomena -- Part II: Applications of Vacuum Arc Science and Technology -- Coatings From the Vacuum Arc -- Vacuum Arc Metal Processing -- Vacuum Switching of High Current and High Voltage at Power Frequencies -- Pulsed Power Applications -- Index -- About the Contributors.

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digitized 2010 HathiTrust Digital Library committed to preserve

Summary: Describes the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.

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eBooks

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Describes the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.

Includes bibliographical references and index.

Print version record.

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Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL

Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. MiAaHDL

http://purl.oclc.org/DLF/benchrepro0212

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