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High speed heterostructure devices / volume editors, Richard A. Kiehl, T.C.L. Gerhard Sollner.

Contributor(s): Series: Semiconductors and semimetals ; v. 41.©1994Description: 1 online resource (xii, 454 pages) : illustrationsContent type:
  • text
Media type:
  • computer
Carrier type:
  • online resource
ISBN:
  • 9780080864389
  • 0080864384
  • 1281715506
  • 9781281715500
Subject(s): Genre/Form: Additional physical formats: Print version:: High speed heterostructure devices.LOC classification:
  • TK7871.85 .H54 1994eb
Online resources:
Contents:
Front Cover; High Speed Heterostructure Devices; Copyright Page; Contents; List of Contributors; Preface; Chapter 1. Quantum Electron Devices: Physics and Applications; I. Introduction; II. Resontant-Tunneling Diodes; III. Resonant Tunneling Bipolar Transistors (RTBTs) with Double Barrier in the Base; IV. Devices with Multiple-Peak I-V Characteristics and Multiple-State RTBTs; V. Circuit Applications; VI. Unipolar Resonant Tunneling Transistors; VII. Superlattice Transport and Quantum Reflections; VIII. Field-Induced Localization in Vertical and Parallel Transport; Acknowledgments; References.
Chapter 2. GaAs-Gate Semiconductor-Insulator-Semiconductor FETI. Introduction-Basic Principles; II. History and Development of SISFETs and Related Devices; III. SIS Capacitors; IV. Design of Vertical Structure; V. Processing Issues; VI. FET Characteristics; VII. SISFET Modeling; VIII. Circuit Results; IX. Discussion and Future Perspective; Acknowledgments; References; Chapter 3. Unipolar InP-Based Transistors; I. Introduction; II. Growth of InP-Based Structures; III. InP Field Effect Transistors (FETs); IV. High Electron Mobility Transistors (HEMTs); V. Summary; VI. Acknowledgments.
V. Nonequilibrium Electron Transport in HBTsVI. Device Characteristics and Limiting Factors; VII. Implementation of HBTs in Integrated Circuits; VIII. Summary and Prospects; References; Chapter 6. High-Frequency Resonant-Tunneling Devices; I. Introduction; II. Times in Resonant Tunneling; III. High-Frequency Applications; IV. Future Expectations; Acknowledgments; References; List of Variables; Chapter 7. Resonant-Tunneling Hot-Electron Transistors and Circuits; I. Introduction; II. Hot Electron Transport in RHETs; III. RHET dc and Microwave Characteristics; IV. RHET Circuit Applications.
V. RHET Room-Temperature OperationVI. Summary; Acknowledgment; References; Index; Contents of Volumes in This Series.
Action note:
  • digitized 2010 HathiTrust Digital Library committed to preserve
Summary: Volume 41 includes an in-depth review of the most important, high-speed switches made with heterojunction technology. This volume is aimed at the graduate student or working researcher who needs a broad overview andan introduction to current literature. Key Features * The first complete review of InP-based HFETs and complementary HFETs, which promise very low power and high speed * Offers a complete, three-chapter review of resonant tunneling * Provides an emphasis on circuits as well as devices.
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Includes bibliographical references and index.

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Volume 41 includes an in-depth review of the most important, high-speed switches made with heterojunction technology. This volume is aimed at the graduate student or working researcher who needs a broad overview andan introduction to current literature. Key Features * The first complete review of InP-based HFETs and complementary HFETs, which promise very low power and high speed * Offers a complete, three-chapter review of resonant tunneling * Provides an emphasis on circuits as well as devices.

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Front Cover; High Speed Heterostructure Devices; Copyright Page; Contents; List of Contributors; Preface; Chapter 1. Quantum Electron Devices: Physics and Applications; I. Introduction; II. Resontant-Tunneling Diodes; III. Resonant Tunneling Bipolar Transistors (RTBTs) with Double Barrier in the Base; IV. Devices with Multiple-Peak I-V Characteristics and Multiple-State RTBTs; V. Circuit Applications; VI. Unipolar Resonant Tunneling Transistors; VII. Superlattice Transport and Quantum Reflections; VIII. Field-Induced Localization in Vertical and Parallel Transport; Acknowledgments; References.

Chapter 2. GaAs-Gate Semiconductor-Insulator-Semiconductor FETI. Introduction-Basic Principles; II. History and Development of SISFETs and Related Devices; III. SIS Capacitors; IV. Design of Vertical Structure; V. Processing Issues; VI. FET Characteristics; VII. SISFET Modeling; VIII. Circuit Results; IX. Discussion and Future Perspective; Acknowledgments; References; Chapter 3. Unipolar InP-Based Transistors; I. Introduction; II. Growth of InP-Based Structures; III. InP Field Effect Transistors (FETs); IV. High Electron Mobility Transistors (HEMTs); V. Summary; VI. Acknowledgments.

V. Nonequilibrium Electron Transport in HBTsVI. Device Characteristics and Limiting Factors; VII. Implementation of HBTs in Integrated Circuits; VIII. Summary and Prospects; References; Chapter 6. High-Frequency Resonant-Tunneling Devices; I. Introduction; II. Times in Resonant Tunneling; III. High-Frequency Applications; IV. Future Expectations; Acknowledgments; References; List of Variables; Chapter 7. Resonant-Tunneling Hot-Electron Transistors and Circuits; I. Introduction; II. Hot Electron Transport in RHETs; III. RHET dc and Microwave Characteristics; IV. RHET Circuit Applications.

V. RHET Room-Temperature OperationVI. Summary; Acknowledgment; References; Index; Contents of Volumes in This Series.

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