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	1.		Image from Amazon.com	Beam technologies for integrated processing [electronic resource] : report of the Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems, National Materials Advisory Board, Commission on Engineering and Technical Systems, National Research Council. by National Research Council (U.S.). Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems ebrary, Inc Publication details: Washington, D.C. : National Academy Press, 1992 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	2.		Image from Amazon.com	Atomic layer deposition [electronic resource] : principles, characteristics, and nanotechnology applications / Tommi Kaariainen ... [et al.]. by Kaariainen, Tommi ebrary, Inc Edition: 2nd ed. Publication details: Hoboken, NJ : John Wiley & Sons, c2013 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	3.		Image from Amazon.com	Chemical vapor synthesis of inorganic nanopowders [electronic resource] / H. Y. Sohn. by Sohn, Hong Yong ebrary, Inc Series: Chemistry research and applications \| Nanotechnology science and technology Publication details: New York : Nova Science Publishers, c2012 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	4.		Image from Amazon.com	Glancing angle deposition of thin films : engineering the nanoscale / Matthew M. Hawkeye, Michael T. Taschuk, Michael J. Brett. by Hawkeye, Matthew M [author.] Taschuk, Michael T [author.] Brett, Michael J [author.] ebrary, Inc Series: Wiley series in materials for electronic and optoelectronic applicationsPublisher: Chichester, England : Wiley, 2014Copyright date: �2014 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	5.		Image from Amazon.com	Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. by Kääriäinen, Tommi Cameron, David, 1949- Kääriäinen, Marja-Leena Sherman, Arthur, 1931- Wiley eBooks Edition: 2nd edition. Publisher: Salem, Massachusetts : Scrivener Publishing, LLC ; Hoboken, New Jersey : Wiley, [2013] Online resources: Click here to access online Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	6.		Image from Amazon.com	Glancing angle deposition of thin films : engineering the nanoscale / Matthew M. Hawkeye, Michael T. Taschuk, Michael J. Brett, NRC National Institute for Nanotechnology. by Hawkeye, Matthew M Taschuk, Michael T Brett, Michael J Wiley eBooks Series: Wiley series in materials for electronic and optoelectronic applicationsPublisher: Chichester, West Sussex, United Kingdom : Wiley, [2014] Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	7.		Image from Amazon.com	Chemical vapor deposition technology of black molybdenum spectrally selective surfaces [electronic resource] / K.A. Gesheva and E.E. Chain. by Gesheva, K. A Chain, E. E ebrary, Inc Publication details: New York : Nova Science Publishers, Inc., c2008 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	8.		Image from Amazon.com	CVD polymers : fabrication of organic surfaces and devices / edited by Karen K. Gleason ; contributors Peter Baumann [and thirty six others]. by Gleason, Karen K [editor.] Baumann, Peter [contributor.] ebrary, Inc Publisher: Weinheim, Germany : Wiley-VCH, 2015Copyright date: copy©2015 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	9.		Image from Amazon.com	Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications / edited by Krishna Seshan. by Seshan, Krishna ScienceDirect eBooks Series: Materials science and process technology series. Electronic materials and process technology. Edition: 2nd ed. ©2002 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	10.		Image from Amazon.com	Diamond chemical vapor deposition : nucleation and early growth stages / by Huimin Liu and David S. Dandy. by Liu, Huimin, 1961- Dandy, David S ScienceDirect eBooks Series: Materials science and process technology series. Electronic materials and process technology.©1995 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	11.		Image from Amazon.com	Organometallic vapor-phase epitaxy : theory and practice / Gerald B. Stringfellow. by Stringfellow, G. B. (Gerald B.), 1942- [author.] ScienceDirect eBooks Edition: Second edition. ©1999 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	12.		Image from Amazon.com	Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan. by Bruno, Giovanni Capezzuto, Pio Madan, A. (Arun) ScienceDirect eBooks Series: Plasma--materials interactions©1995 Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	13.		Image from Amazon.com	Handbook of chemical vapor depostion [i.e. deposition] (CVD) : principles, technology, and applications / by Hugh O. Pierson. by Pierson, Hugh O Pierson, Hugh O. Handbook of chemical vapor deposition (CVD) ScienceDirect eBooks Series: Materials science and process technology series Edition: 2nd ed. ©1999 Other title: Handbook of chemical vapor deposition Online resources: Click here to access online Availability: No items available. Place hold Save to lists Add to cart (remove)
	14.		Image from Amazon.com	Semiconductor manufacturing handbook [electronic resource] / Hwaiyu Geng, editor in chief. by Geng, Hwaiyu Zhou, Lin Park, Ilsun Ravi, K. V Rathore, Hazara S Chanda, Kaushik Ren, L. P Tu, King N Coumou, David J Biltoft, Peter Howard, Charles Mack, Chris A Graf, Michael Zhang, Peng Lai, Shouliang Solzbacher, Florian McInerney, Edward J Ramdani, Jamal Vaccari, Giovanni Ritzdorf, Tom Klocke, John Dyer, Timothy S Machamer, Andrew Blair, Donald W Arai, Kazuhisa Kobayashi, Yoshikazu Otani, Hideaki Tonnies, Dietrich Topper, Michael Wang, Zhong L Huff, Michael A Liu, David N Curcie, Wayne D Sweeney, Joseph D Cox, James C Cavicchi, Kristin Barsness, Dan Gould, Charles K Albrecht, David J Li, Bo Carriker, Wayne Haris, Clint Peltinov, Ram Menaker, Mina Scibilia, Bruno Altis, Yoan Dupret McCafferty, Robert H Davis, Brett J Trammell, Steven R Pavlotsky, Richard V Beck, Stephen C Gendreau, Michael Amick, Hal Levit, Larry Muller, Chris Kochevar, Steven Gromala, Jerry Pinkowski, Richard E McGraw-Hill eBooks IDC Corporation Series: McGraw-Hill's AccessEngineering Publication details: New York : McGraw-Hill, [2005] Online resources: Subscription required Availability: No items available. Place hold Save to lists Add to cart (remove)

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